Search results for "Hydrogen silsesquioxane"
showing 3 items of 3 documents
MEMS analogous micro-patterning of thermotropic nematic liquid crystalline elastomer films using a fluorinated photoresist and a hard mask process
2017
In this work, we present a method to pattern liquid crystal elastomers (LCEs) in the micrometer range without using any mechanical processing steps to prepare micron sized LCE actuators compatible with microelectromechanical system (MEMS) technology. Multi-layer spin-coating processes are developed to synthesise and structure 300–3500 nm thick LCE films. A water soluble sacrificial layer, a photoalignment layer and a LCE formulation, which is polymerised and crosslinked in its liquid crystal phase, are spin-coated successively onto a substrate. A fluorinated photoresist layer is used to structure LCE films with thicknesses up to 700 nm in a photolithographic and etching process. For thicker…
Adhesion of proton beam written high aspect ratio hydrogen silsesquioxane (HSQ) nanostructures on different metallic substrates
2009
Abstract Hydrogen silsesquioxane (HSQ) behaves as a negative resist under MeV proton beam exposure. HSQ is a high-resolution resist suitable for production of tall (
Proton beam written hydrogen silsesquioxane (HSQ) nanostructures for Nickel electroplating
2009
Abstract Hydrogen silsesquioxane (HSQ) behaves as a negative resist under MeV proton beam exposure. HSQ is a high-resolution resist suitable for production of tall ( 1.5 μ m ) high-aspect-ratio nanostructures with dimensions down to 22 nm. High-aspect-ratio HSQ structures are required in many applications, e.g. nanofluidics, biomedical research, etc. Since P-beam writing is a direct and hence slow process, it is beneficiary to fabricate a reverse image of the patterns in a metallic stamp, e.g. by Ni electroplating. The Ni stamp can then be used to produce multiple copies of the same pattern. In this study we investigate the possibility to produce Ni stamps from p-beam written HSQ samples. H…